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| Volume 4, Issue 04 - 2008 |
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| 1 |
ANALYSIS OF THIN NANOSTRUCTURED BLOCK COPOLYMER FILMS BY GISAXS AND AFM |
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| Pages 119-127 |
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| D. JEHNICHEN*,1, D. POSPIECH1, R. KESKA1, S. PTACEK1, A. JANKE1, S.S. FUNARI2, A. TIMMANN2, C.M. PAPADAKIS3 |
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1 Leibniz Institute of Polymer Research Dresden, Hohe Str. 6, D-01069 Dresden, Germany
2 HASYLAB at DESY Hamburg, Notkestr. 85, D-22603 Hamburg, Germany
3 Physikdepartment E13, Technische Universität München, James-Franck-Str. 1, D-85747 Garching, Germany
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| Received 13 April 2007; accepted 4 September 2008 |
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| The aim of this work was to develop nanostructured polymer surfaces. For this purpose, diblock copolymers of poly(n-pentyl methacrylate) and poly(methyl methacrylate) with different block lengths and block length ratios were chosen, which show a bulk morphology with stacked lamellae or hexagonally packed cylinders. The bulk structure was characterized by SAXS investigations in dependence on temperature. Lamellar morphologies were found in a wide range of block length ratios. A set of polymers was selected for thin film investigations, and the phase behaviour of dip-coated films was studied by both AFM and GISAXS. In most cases, parallel ordered morphologies were formed, which is a result of the wetting behaviour of block copolymers. However, in a few cases, laterally ordered and demixed morphologies were detected, which are an essential precondition to obtain later on surfaces with regions of different wettability.
Keywords: N/A |
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